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Magnetron sputtering on 3d components with less accessible areasBENIEN, H; MEYER, M; PSYK, W et al.Metall (Berlin, West). 1991, Vol 45, Num 3, pp 246-249, issn 0026-0746Article

Propriétés lubrifiantes des films de disulfure de molybdène déposés par pulvérisation haute fréquence. 1. Comparaison des propriétés lubrifiantes pour les films obtenus par la méthode conventionnelle et par la méthode à deux ciblesNISHIMURA, M; NOSAKA, M; SUZUKI, M et al.Junkatsu. 1985, Vol 30, Num 9, pp 671-678, issn 0449-4156Article

Surface structural damage produced in InP (100) by R.F. plasma or sputter depositionDAUTREMONT-SMITH, W. C; FELDMAN, L. C.Thin solid films. 1983, Vol 105, Num 2, pp 187-196, issn 0040-6090Article

Structural and elastic properties of zirconium nitrite-aluminium nitride multilayersMENG, W. J; EESLEY, G. L; SVINARICH, K. A et al.Physical review. B, Condensed matter. 1990, Vol 42, Num 7A, pp 4881-4884, issn 0163-1829Article

Characterization of radio frequency unbalanced magnetronsWINDOW, B; HARDING, G. L.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1992, Vol 10, Num 5, pp 3300-3304, issn 0734-2101Article

Radio frequency sputtering process of a polytetrafluoroethylene target and characterization of fluorocarbon polymer filmsMARECHAL, N; PAULEAU, Y.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1992, Vol 10, Num 3, pp 477-483, issn 0734-2101Article

Validity of self-bias voltage measurements on insulating electrodes in radio-frequency dry etching systemsDE VRIES, C. A. M; VAN DEN HOEK, W. G. M.Journal of applied physics. 1985, Vol 58, Num 5, pp 2074-2076, issn 0021-8979Article

Thin film coating techniques on wires and inner walls of small tubes via cylindrical magnetron sputteringHOSHI, Y; NAOE, M; YAMANAKA, S et al.Electrical engineering in Japan. 1983, Vol 103, Num 1, pp 16-22, issn 0424-7760Article

Radio frequency sputtering ― the significance of power inputHORWITZ, C. M.Journal of vacuum science and technology. A, vacuum, surfaces, and films. 1983, Vol 1, Num 4, pp 1795-1800Article

ALIMENTATION ELECTRIQUE POUR LA PULVERISATION DE COUCHES MINCES DANS UN CHAMP HAUTE FREQUENCEZBIKOWSKI A; KOLATOR W.1971; PRACE PRZEMYSL. INST. ELEKTRON.; POLSKA; DA. 1971; VOL. 12; NO 3-4; PP. 119-124Serial Issue

AN INVESTIGATION OF RF SPUTTER ETCHED SILICON SURFACES USING HELIUM ION BACKSCATTER.SACHSE GW; MILLER WE; GROSS CE et al.1975; SOLID-STATE ELECTRON.; G.B.; DA. 1975; VOL. 18; NO 5; PP. 431-435; BIBL. 14 REF.Article

BELL-JAR RF SPUTTERING SYSTEM.ROCK FC; SMITH CW.1975; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1975; VOL. 12; NO 4; PP. 943-945; BIBL. 9 REF.Conference Paper

SILICON NITRIDE FILMS BY DIRECT RF SPUTTER DEPOSITION.KOMINIAK GJ.1975; J. ELECTROCHEM. SOC.; U.S.A.; DA. 1975; VOL. 122; NO 9; PP. 1271-1273; BIBL. 58 REF.Article

R.F. DIODE SPUTTERING IN PERMANENT-MATCH MODECHRISTENSEN O; OLSEN OH; HOLM NE et al.1983; THIN SOLID FILMS; ISSN 0040-6090; CHE; DA. 1983; VOL. 100; NO 3; PP. 181-191; BIBL. 25 REF.Article

ULTRA-STABLE SYSTEM FOR RF SPUTTERING WITH RF-INDUCED SUBSTRATE BIAS.VOSSEN JL; O'NEILL JJ JR.1975; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1975; VOL. 12; NO 5; PP. 1052-1057; BIBL. 19 REF.Article

ATOMIC ARRANGEMENTS IN SPUTTERED THIN FILMS OF VITREOUS SE-AS WITH 36 TO 50 AT % AS.RECHTIN MD; AVERBACH BL.1975; PHYS. STATUS SOLIDI, A; ALLEM.; DA. 1975; VOL. 28; NO 1; PP. 283-292; ABS. ALLEM.; BIBL. 26 REF.Article

OXIDATION OF LEAD FILMS BY RF SPUTTER ETCHING IN AN OXYGEN PLASMA.GREINER JH.1974; J. APPL. PHYS.; U.S.A.; DA. 1974; VOL. 45; NO 1; PP. 32-37; BIBL. 17 REF.Article

DEPOT DE STRUCTURES MULTICOUCHES A L'AIDE D'UN DISPOSITIF DE PULVERISATION IONIQUE HAUTE FREQUENCE COMPORTANT DEUX CIBLESOBUCHOWICZ F; KAZIMIERCZUK W.1974; PRACE OSRODKA BADAWCZO-ROZWOJOW. ELEKTRON. PROZNIOW.; POLSKA; DA. 1974; VOL. 1; NO 1; PP. 71-77; ABS. ANGL. RUSSE; BIBL. 5 REF.Article

AUFBAU EINES ASYMMETRISCHEN DIODENSYSTEMS FUER DIE HOCHFREQUENZPLASMAZERSTAEUBUNG. = CONCEPTION D'UN SYSTEME DE DIODE ASYMETRIQUE POUR LA PULVERISATION EN HAUTE FREQUENCEKALTOFEN R; THIEMT K; REINHARD G et al.1976; EXPER. TECH. PHYS.; DTSCH.; DA. 1976; VOL. 24; NO 5; PP. 479-487; ABS. ANGL.; BIBL. 17 REF.Article

BESTIMMUNG DER PINHOLE-DICHTE VON ISOLATORSCHICHTEN DURCH CHEMISCHES AETZEN (I). DAS SYSTEM SILIZIUM-SILIZIUMDIOXID. = DETERMINATION PAR ATTAQUE CHIMIQUE DE LA DENSITE DES "TROUS D'EPINGLES" DANS DES COUCHES ISOLANTES (I). LE SYSTEME SILICIUM-DIOXYDE DE SILICIUMTHIEMT K; KALTOFEN R.1975; KRISTALL U. TECH.; DTSCH.; DA. 1975; VOL. 10; NO 3; PP. 305-312; ABS. ANGL.; BIBL. 17 REF.Article

RADIO FREQUENCY PLASMA EXCITATIONBURDEN M ST J; CROSS KB.1979; VACUUM; GBR; DA. 1979; VOL. 29; NO 1; PP. 13-14Article

IMPROVEMENT OF RF SPUTTERING BY CROSSED EM FIELDS.HADEN CR.1975; I.E..E.E. TRANS. INDUSTR. ELECTRON. CONTROL INSTRUMENT.; U.S.A.; DA. 1975; VOL. 22; NO 4; PP. 549-552; BIBL. 4 REF.Article

VARIATION DE COMPOSITION D'UNE COUCHE MINCE D'UN VERRE INDUSTRIEL DEPOSEE PAR PULVERISATION HAUTE FREQUENCESHIMOMOTO Y; NISHIMURA T.1975; J. VACUUM SOC. JAP.; JAP.; DA. 1975; VOL. 18; NO 6; PP. 191-200; ABS. ANGL.; BIBL. 6 REF.Article

PROPERTIES OF IRREGULAR BOUNDARY OF RF SPUTTERED GLASS FILM FOR LIGHT GUIDESUEMATSU Y; FURUY K; HAKUTA M et al.1972; PROC. I.E.E.E.; U.S.A.; DA. 1972; VOL. 60; NO 6; PP. 744-745; BIBL. 6 REF.Serial Issue

PULVERISATION DE COUCHES MINCES METALLIQUES ET DIELECTRIQUES LORS D'UNE DECHARGE HAUTE FREQUENCEBRZEZINSKA D.1971; PRACE PRZEMYSL. INST. ELEKTRON.; POLSKA; DA. 1971; VOL. 12; NO 3-4; PP. 114-118; BIBL. 2 REF.Serial Issue

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